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研究报告

摘要：利用氢基质生物膜反应器(Hydrogen-based membrane biofilm reactor,MBfR)研究了NO₃^--N负荷、SO₄^2-负荷、As(Ⅴ)负荷、氢分压对水中砷去除效果的影响.结果表明,随着NO₃^--N进水负荷的增加,As(Ⅴ)和SO₄^2-还原受到明显抑制,系统产生As(Ⅲ)和NO₂^-的积累;随着SO₄^2-进水负荷的增加,反应器内总砷去除率由78.6%(25 mg·L^-1 SO₄^2-)降低至1.1%(200 mg·L^-1 SO₄^2-),而此时NO₃^--N的去除基本不受影响.同时,随着进水As(Ⅴ)负荷从0.25 mg·L^-1增至2 mg·L^-1,出水SO₄^2-浓度明显升高,反应器内总砷去除率从70.0%降低至47.3%,而此时NO₃^--N的去除基本不受影响;当氢分压低于0.06 MPa时,提高氢分压可降低出水As(Ⅴ)浓度,当氢分压高于0.06 MPa后便不再是控制因素.由于体系中氢自养还原微生物会优先利用NO₃^--N和SO₄^2-作为电子受体,因此,为了保证As(Ⅴ)的高效还原去除,必须控制氢分压在0.05~0.07 MPa之间.

Abstract：A continuous stirred hydrogen-based membrane biofilm reactor (MBfR) was used to study the effects of influent concentration of NO₃^--N,SO₄²^-,As(Ⅴ) and H₂ pressure for the removal of As(Ⅴ) in water. The results demonstrated that As(Ⅴ) and SO₄^2- reduction was inhibited by the increase of NO₃^--N influent concentration. NO₂^- began to accumulate at the NO₃^--N concentration of 20 mg·L^-1 and As(Ⅲ) was accumulated because of the shortage of S^2-. When influent NO₃^--N concentration was higher than 50 mg·L^-1,the total As removal rate was nearly zero. As(Ⅴ) and SO₄^2- reduction was suppressed with the increase of SO₄^2- concentration,and total As removal efficiency decreased from 78.6% (influent SO₄^2- 25 mg·L^-1) to 1.1% (influent SO₄^2- 200 mg·L^-1). As(Ⅴ) concentration had a great influence on As(Ⅴ) and SO₄^2- reduction rates. Total As removal efficiency decreased from 70.0% (influent As(Ⅴ) 0.25 mg·L^-1) to 47.3% (influent As(Ⅴ) 2 mg·L^-1). Higher H₂ pressure,no more than 0.06 MPa,would increase As(Ⅴ) reduction flux. As(Ⅴ) removal would be insensitive to H₂ pressure. But the reduction of NO₃^--N and SO₄^2- compete more strongly for electron donor (H₂) than As(Ⅴ). In order to keep high removal efficiency of total As,H₂ pressure should be controlled in the range of 0.05~0.07 MPa.

Key words：hydrogen-based membrane biofilm reactor arsenate influence factors